Direct from our manufacturing workshop: certified fused quartz glass plates, multi-bore reaction tubes, and CNC-machined CVD apparatus engineered to withstand severe thermal, chemical, and vacuum environments.
Lianyungang Zelvo Quartz Products Co., Ltd. operates at the core of Donghai County, Jiangsu Province—globally acknowledged as China's silica capital. Combining direct access to the world's most concentrated high-purity natural silica reserves with over a decade of precision glass-blowing, CNC milling, and laser drilling, we bridge the gap between raw silica ingot processing and cleanroom-ready semiconductor components.
Our raw quartz ingots undergo hydrofluoric/nitric acid pickling, electrostatic separation, and vacuum electro-fusion. Total metallic impurities (Fe, Al, Ca, Mg, Ti, Na, K, Li) remain consistently under 15–20 ppm, ensuring zero dopant outgassing in high-temperature semiconductor furnaces.
Equipped with 5-axis ultrasonic CNC grinding centers, high-speed diamond wafer saws, and pulsed fiber laser drilling stations. We fabricate slotted sample holders, microfluidic quartz plates, and beveled wafer rings down to ±0.01 mm dimensional tolerances without micro-fractures.
Our full facility and corporate registration are legally audited and onsite-checked by third-party inspectors. We operate an agile engineering bureau providing comprehensive Design For Manufacturability (DFM) reviews and formal quotes within 2 hours of drawing receipt.
Unlike state-run raw material conglomerates that require multi-ton minimums, we nurture research labs and specialized industrial equipment builders with an absolute 1-piece MOQ for bespoke drawings, backed by multi-layered cleanroom vacuum packaging and worldwide air freight.
When procuring precision quartz plates and windows, design engineers must distinguish between Electrically Fused Natural Quartz (Type II) and Synthetic Chemical Vapor Deposition Fused Silica (Type III / JGS1). Fused quartz is engineered through the continuous electric resistance melting of high-purity natural silica sand under inert atmosphere, maximizing refractory resistance up to 1300°C with an ultra-low hydroxyl (OH) content (< 5 ppm).
Synthetic fused silica, produced by hydrolyzing volatile silicon tetrachloride (SiCl₄) in an oxy-hydrogen flame, features near-zero trace metals (< 0.1 ppm) and exceptional deep-ultraviolet (DUV) transparency down to 185 nm, making it indispensable for excimer laser optics, semiconductor photolithography, and UV-curing windows.
Both material variants exhibit an exceptionally low coefficient of thermal expansion (α = 5.5 × 10⁻⁷ /°C) between 20°C and 320°C. This allows a 10mm thick quartz plate to be heated red-hot to 1100°C and plunged directly into ice water at 0°C without catastrophic mechanical cracking or structural stress delamination.
| Physical Property (20°C) | Standard Value | Engineering Significance |
|---|---|---|
| Chemical Purity (SiO₂) | ≥ 99.992% | Guarantees zero furnace contamination |
| Density (ρ) | 2.20 ± 0.02 g/cm³ | Ultra-compact non-porous structure |
| Thermal Expansion (α) | 5.5 × 10⁻⁷ /°C | Zero thermal shock rupture up to 1100°C |
| Softening Point | 1683°C | Exceeds extreme refractory thresholds |
| Annealing Point | 1215°C | Residual thermal stress relief baseline |
| Strain Point | 1120°C | Continuous structural load-bearing limit |
| Dielectric Strength (1 MHz) | 5.0 × 10⁷ V/m | Premium RF/Microwave transparent insulator |
| Refractive Index (n_d) | 1.4585 | Low optical dispersion across spectra |
| Mohs Hardness | 5.5 – 6.5 | High scratch resistance and wear life |
The global high-purity quartz glass plate and component sector is undergoing a rapid transition triggered by high-density semiconductor fabrication, next-generation solar cells, and harsh-environment photonic systems.
As semiconductor wafer fabrication migrates beneath the 3nm threshold and 3D-NAND architectures stack past 300 layers, fluorine and chlorine-based plasma etch chambers demand quartz plates and rings with significantly enhanced surface integrity. The industry is rapidly adopting high-density flame-polished and doped fused silica with near-zero bubble density (DIN 58927 Class 0) to prevent micro-particle spalling that degrades wafer yield.
With TOPCon and tandem Perovskite-Silicon PV cells displacing legacy PERC production, thermal diffusion and atomic layer deposition (ALD) stages require large-aperture quartz plates exceeding 1200mm × 800mm with wall thickness uniformity of ±0.05 mm. Buyers are securing guaranteed long-term allocations from verified Chinese exporters that integrate electric fusion ingots directly into high-precision CNC slicing operations.
Global optical and lab equipment OEMs are abandoning the two-tier procurement model—purchasing rough quartz blanks in Asia and shipping them to Western optical shops for milling. Instead, buyers are selecting turnkey precision suppliers in Donghai, Jiangsu, who execute laser core-drilling, surface chemical mechanical polishing (CMP to Ra < 0.5nm), and spectrophotometric validation before export, cutting supply chain lead times by 60%.
Every batch of fused quartz plates and custom glass instruments leaving our Lianyungang manufacturing plant follows a rigorous 4-stage metrological verification sequence, documented with material certificates and optical test sheets.
Raw silica ingots undergo Inductively Coupled Plasma Optical Emission Spectrometry to test for metallic trace cations (Al, Fe, Ti, Ca, Mg, Na, K, Li). Only ingots certified at ≥ 99.99% SiO₂ are approved for semiconductor wafer plate slicing.
Plates and machined slotted carriers are inspected using coordinate measuring machines (CMM) and laser micrometer gauges. Planar optical windows are checked on a Zygo laser interferometer to verify flatness within λ/4 to λ/10 per inch.
All fire-bent and welded quartz reactors undergo automated polariscope examination to assess residual stress. If photoelastic retardation exceeds 10 nm/cm, components undergo secondary computerized annealing at 1215°C.
Finished components receive ultrasonic de-ionized water cleansing, particulate wiping, double vacuum heat-sealing in cleanroom PE bags, and multi-layer shockproof sponge suspension inside heavy-gauge export plywood crates.
Addressing the technical, commercial, and operational questions most frequently raised by process engineers, supply chain managers, and optical procurement specialists.
JGS1 (Synthetic Fused Silica): Manufactured via SiCl₄ synthesis. It has virtually no bubbles or inclusions, very high OH content (~800–1200 ppm), and delivers exceptional optical transmission across the deep ultraviolet spectrum (185 nm – 2500 nm). Ideal for UV lasers, stepper optics, and photolithography.
JGS2 (Optical Fused Quartz): Smelted from natural high-purity quartz crystal in hydrogen-oxygen flames. Useful transmission ranges from 220 nm to 2500 nm. Excellent cost-to-performance balance for optical windows, laboratory viewports, and UV lamp jackets.
JGS3 (Infrared Fused Quartz): Produced via electric resistance vacuum fusion of natural quartz. It possesses negligible hydroxyl content (< 5 ppm), eliminating the distinct OH absorption dip at 2.73 μm and transmitting from 260 nm up to 3500 nm in the deep infrared spectrum.
Our standard machining tolerance is ±0.10 mm on external length, width, and thickness. Utilizing high-precision CNC 5-axis surface grinding and optical chemical-mechanical polishing (CMP), we regularly achieve ±0.02 mm on semiconductor plate dimensions and ±0.01 mm on hole diameter and laser slot pitch. For optical flat windows, surface roughness Ra < 0.5 nm and scratch-dig specifications of 20-10 or 40-20 (MIL-PRF-13830B) are available upon request.
Fused quartz exhibits extraordinary chemical inertness. It is completely impervious to all industrial and laboratory acids—including sulfuric, nitric, and hydrochloric acids—even at boiling temperatures. The only critical exceptions are Hydrofluoric Acid (HF), which attacks silica rapidly at room temperature, and concentrated Phosphoric Acid above 150°C. Prolonged contact with strongly alkaline solutions (pH > 10) at high temperatures will gradually etch the quartz surface through dissolution of the SiO₂ network.
Devitrification is the phase transformation of metastable amorphous fused silica into crystalline cristobalite. This process begins around 1000°C–1150°C and accelerates with temperature and surface impurities. Alkalis (Na, K, Li) or skin oils from bare fingers act as powerful nucleation catalysts. Once cristobalite forms, cooling through 270°C causes a violent 5% volume contraction that produces severe micro-crazing and hazing. To maximize lifetime, ensure surfaces are washed with high-purity ethanol/DI water and avoid operating unannealed components above 1150°C in contaminated atmospheres.
We maintain an absolute 1-piece MOQ for custom CNC-machined plates, slotted XRD carriers, welded reactor vessels, and twin-bore tubes. This policy directly accommodates university researchers, pilot line engineers, and OEM instrument designers. For high-volume standard consumables like BET sample tubes and patio heater replacements, standard order increments typically start at 10 to 50 pieces.
We routinely export under EXW, FOB (Shanghai / Qingdao / Lianyungang), CIF, CFR, CIP, and door-to-door DDP terms with customs duties prepaid. Payment is accepted via T/T wire transfer, L/C at sight, PayPal, Western Union, and secure Trade Assurance escrow. To ensure zero transit breakage, fragile plates and bell jars are nested in high-density closed-cell polyethylene foam, encased in reinforced export-grade plywood crates, and backed by transit insurance coverage.
Submit your 2D CAD drawings (DXF, DWG, PDF) or 3D STEP files with target operating temperatures, purity grades, and quantities. Our senior optical glass engineers will complete a technical DFM review and provide a factory-direct quotation within 2 hours.